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TITLE(s): PHOTO MASK PATTERN GENERATOR (electron. comp.) alternate titles: pattern generator operator Operates pattern-generating machine to transfer integrated circuit pattern onto surface of reticle for use by PHOTO MASK PROCESSOR (electron. comp.) 976.384-014 in production of photo mask plates used in fabrication of semiconductor devices: Reads specifications to determine production data and enters data into pattern-generating machine, using keyboard. Loads digitizer tape into machine reader to control exposure process. Positions unexposed photoresist coated reticle on projection stage of machine and adjusts focus. Types commands to activate machine that exposes photoresist on reticle to circuit pattern. Tends developing and etching equipment to develop and etch pattern on reticle. Inspects reticle for defects, using microscope. GOE: 05.10.05 STRENGTH: L GED: R3 M3 L3 SVP: 5 DLU: 86 ONET CROSSWALK: 92908 Photographic Processing Machine Operators and Tenders |
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CODE: 976.382-038 Buy the DOT: Download
TITLE(s):
PHOTO MASK PATTERN GENERATOR (electron. comp.) alternate titles: pattern generator
operator
Operates pattern-generating machine to transfer integrated circuit pattern onto surface of
reticle for use by PHOTO MASK PROCESSOR (electron. comp.) 976.384-014 in production of photo
mask plates used in fabrication of semiconductor devices: Reads specifications to determine
production data and enters data into pattern-generating machine, using keyboard. Loads digitizer
tape into machine reader to control exposure process. Positions unexposed photoresist coated reticle
on projection stage of machine and adjusts focus. Types commands to activate machine that exposes
photoresist on reticle to circuit pattern. Tends developing and etching equipment to develop and
etch pattern on reticle. Inspects reticle for defects, using microscope.
GOE: 05.10.05 STRENGTH: L GED: R3 M3 L3 SVP: 5 DLU: 86
ONET CROSSWALK: 92908 Photographic Processing Machine Operators and Tenders
© 1995 - 2015 Photius Coutsoukis and Information Technology Associates (All Rights Reserved). Revised 26-May-03