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TITLE(s): PHOTO MASK MAKER, ELECTRON-BEAM (electron. comp.) alternate titles: electron-beam operator Operates computer-controlled electron-beam exposure equipment to transfer circuit pattern onto photoresist-coated photo mask plates for subsequent use in fabrication of semiconductor devices: Loads disk or tape of pattern information into equipment, and positions unexposed photo mask plate in vacuum chamber of equipment. Types commands to enter exposure specifications and production instructions and activate equipment that directs electron beam at specified locations on coated photo mask plate to expose photoresist. Develops and etches exposed photo mask plate, using automatic developing and etching equipment. Inspects pattern on photo mask plate for conformance to specifications, using microscope and specialized inspection devices. GOE: 05.10.05 STRENGTH: L GED: R3 M2 L3 SVP: 6 DLU: 86 ONET CROSSWALK: 89712 Photoengravers | |||||||||||||||||||||||||||||||||||
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