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CODE: 590.685-070Buy the DOT: Download
TITLE(s): DIFFUSION FURNACE OPERATOR, SEMICONDUCTOR WAFERS (electron. comp.)

Tends furnaces that diffuse chemicals into semiconductor wafer surface to alter electrical characteristics of wafer or to protect wafer surfaces: Places semiconductor wafers in containers, such as boat or cassette, using vacuum wand or tweezers. Places loaded container on furnace loader, such as conveyor, track, sled, or tube. Pushes button to advance wafer containers into furnace or pushes wafer container into furnace tube, using quartz rod. Pushes buttons or keys commands on control panel keyboard to activate furnace diffusion cycle. Observes gauges and meters to verify that furnace gases and temperature meet specifications. Maintains production records. Turns dials to adjust furnace gases and temperature, if required. May clean semiconductor wafers, using cleaning equipment, to remove contaminants prior to diffusion. May test and inspect wafer, using testing equipment, to measure resistivity and thickness.
GOE: 06.04.19 STRENGTH: L GED: R2 M2 L2 SVP: 4 DLU: 86
ONET CROSSWALK: 92902A Electronic Semiconductor Processors

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CODE: 590.685-070 Buy the DOT: Download
TITLE(s): DIFFUSION FURNACE OPERATOR, SEMICONDUCTOR WAFERS (electron. comp.)

Tends furnaces that diffuse chemicals into semiconductor wafer surface to alter electrical characteristics of wafer or to protect wafer surfaces: Places semiconductor wafers in containers, such as boat or cassette, using vacuum wand or tweezers. Places loaded container on furnace loader, such as conveyor, track, sled, or tube. Pushes button to advance wafer containers into furnace or pushes wafer container into furnace tube, using quartz rod. Pushes buttons or keys commands on control panel keyboard to activate furnace diffusion cycle. Observes gauges and meters to verify that furnace gases and temperature meet specifications. Maintains production records. Turns dials to adjust furnace gases and temperature, if required. May clean semiconductor wafers, using cleaning equipment, to remove contaminants prior to diffusion. May test and inspect wafer, using testing equipment, to measure resistivity and thickness.
GOE: 06.04.19 STRENGTH: L GED: R2 M2 L2 SVP: 4 DLU: 86
ONET CROSSWALK: 92902A Electronic Semiconductor Processors


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