|
TITLE(s): EPITAXIAL REACTOR OPERATOR (electron. comp.) Controls and monitors operation of epitaxial reactor to deposit layer of semiconductor material, such as gallium arsenide or silicon, onto semiconductor wafer surface in production of electronic components, such as transistors, diodes, and integrated circuits, and tests sample processed wafers to evaluate epitaxial layer properties, such as thickness and resistivity, using testing equipment: Cleans semiconductor wafers, using cleaning equipment such as chemical baths and automatic wafer cleaners, to prepare wafers for deposit of epitaxial layer. Places wafers on wafer holder (suspector), using tweezers or vacuum wand, to load reactor. Pushes buttons, flips switches, turns dials, and observes gauges to set and adjust reactor temperature and gas pressure to specified levels and to start reactor cycle. Monitors temperature and gas gauges during processing cycle and turns dials to adjust temperature and gas levels. Tests epitaxial layer on wafers, using testing equipment, to evaluate thickness and resistivity of layer. Records production data in logbook and processing documents. Cleans and maintains equipment and work area. May compute production statistics, using calculator. GOE: 06.02.18 STRENGTH: L GED: R3 M3 L3 SVP: 4 DLU: 86 ONET CROSSWALK: 92902D Electronic Semiconductor Crystal-Growing Technicians and Equipment Operators |
Language Translations | | Espaρol | Children | Lawyers | E-mail "Immigration Superhighway", "Immigration Central", "Immigration Assistant", "Immigration Expert", "Immigration Expert Pro" and "Immigration USA" are trademarks of Information Technology Associates.
© 1995 - 2015 Photius Coutsoukis and Information
Technology Associates (All Rights Reserved).
|
Previous Next Contents ONET About
CODE: 590.382-018 Buy the DOT: Download
TITLE(s):
EPITAXIAL REACTOR OPERATOR (electron. comp.)
Controls and monitors operation of epitaxial reactor to deposit layer of semiconductor material,
such as gallium arsenide or silicon, onto semiconductor wafer surface in production of electronic
components, such as transistors, diodes, and integrated circuits, and tests sample processed wafers
to evaluate epitaxial layer properties, such as thickness and resistivity, using testing equipment:
Cleans semiconductor wafers, using cleaning equipment such as chemical baths and automatic wafer
cleaners, to prepare wafers for deposit of epitaxial layer. Places wafers on wafer holder
(suspector), using tweezers or vacuum wand, to load reactor. Pushes buttons, flips switches, turns
dials, and observes gauges to set and adjust reactor temperature and gas pressure to specified
levels and to start reactor cycle. Monitors temperature and gas gauges during processing cycle and
turns dials to adjust temperature and gas levels. Tests epitaxial layer on wafers, using testing
equipment, to evaluate thickness and resistivity of layer. Records production data in logbook and
processing documents. Cleans and maintains equipment and work area. May compute production
statistics, using calculator.
GOE: 06.02.18 STRENGTH: L GED: R3 M3 L3 SVP: 4 DLU: 86
ONET CROSSWALK: 92902D Electronic Semiconductor Crystal-Growing Technicians and Equipment Operators
© 1995 - 2015 Photius Coutsoukis and Information Technology Associates (All Rights Reserved). Revised 26-May-03